Gas Panel / MFC
Mass Flow Controller & Process Gas Monitoring
GAS READY
Total Flow
0 sccm
Active Gas
0
Operation Control
Tool sequence command panel
CF₄40 sccm
CHF₃20 sccm
Ar80 sccm
O₂0 sccm
Cl₂0 sccm
BCl₃0 sccm
HBr0 sccm
Pressure30 mTorr
ICP RF1200 W
Bias RF250 W
Chuck Temp20 °C
Time45 sec
Process Gas Line
He Backside Cooling
Exhaust to Abatement
PT-101
Gas
PT-102
Chamber
TT-100
Chuck
PS-101
Door
PG-201
Vac
● ● ● ● ● ● ● ● ●
ESC-101 Electrostatic Chuck
RF Generator ICP
13.56 MHz
Forward: 0 W
Status: OFF
MN-ICP Matching
C1: 0% C2: 0%
Reflected: 0 W
RF Generator Bias
13.56 MHz
Forward: 0 W
DC Bias: 0 V
MN-BIAS Matching
Wafer Ion Energy Control
ESC Power Supply
Clamp: 0 V
He: 0 Torr
GV-201
Gate Valve
TMP-201
Turbo Molecular Pump
DP-201
Dry Pump